| Titolo | Surface and interface morphology of thin oxide films investigated by X-ray reflectivity and atomic force microscopy |
|---|---|
| Tipo di pubblicazione | Articolo su Rivista peer-reviewed |
| Anno di Pubblicazione | 1998 |
| Autori | Alvisi, Marco, Leo G., Rizzo Antonella, Tapfer Leander, and Vasanelli L. |
| Rivista | Surface and Coatings Technology |
| Volume | 100-101 |
| Paginazione | 76-79 |
| ISSN | 02578972 |
| Parole chiave | Atomic force microscopy, Dual ion beam sputtering technique, Hafnium compounds, Interfaces (materials), Ion beams, Morphology, Optical films, Silica, Sputter deposition, Substrates, Surface roughness, Thin films, X ray reflectivity, X ray scattering, Zirconia |
| Abstract | In this work, we investigate in details the air/film and film/substrate interface morphology of single HfO2, SiO2 and ZrO2 films by means of X-ray reflectivity and atomic force microscopy measurements. The films were deposited on silicon substrate by dual ion beam sputtering technique. The roughness obtained from the X-ray scattering experiments were compared with the atomic force microscopy data. © 1998 Published by Elsevier Science S.A. |
| Note | cited By 1 |
| URL | https://www.scopus.com/inward/record.uri?eid=2-s2.0-0032021648&partnerID=40&md5=7c60450f9db149f3ba817fa0943509c0 |
| Citation Key | Alvisi199876 |
