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Rapid soft lithography by bottom-up enhanced capillarity

TitoloRapid soft lithography by bottom-up enhanced capillarity
Tipo di pubblicazioneArticolo su Rivista peer-reviewed
Anno di Pubblicazione2004
AutoriPisignano, D., Di Benedetto Francesca, Persano L., Gigli G., and Cingolani R.
RivistaLangmuir
Volume20
Paginazione4802-4804
ISSN07437463
Parole chiaveCapillarity, Etching, Hydrophilicity, Lithography, Masks, Microfluidics, Nanoelectronics, nanotechnology, Pattern transfer, Reactive ion etching, Soft molding, Thermal stability, Thermodynamic stability, Viscosity, wettability
Abstract

The growing demand for new solutions to pursue the trend of micro- and nanoelectronics predicted by Moore's law is stimulating the development of new high-resolution, low-cost lithographies. Here we demonstrate that several bottom-up approaches can be used to increase the throughput of soft lithography by exploiting the enhanced hydrophilicity, the low viscosity, and the fragility of the employed materials. In particular, the customized functionalization of the involved surfaces to improve the wettability to polymer fluids and the dramatic decrease of the viscosity of polymer compounds as the temperature is increased, together with the good thermal stability of the functionalized surfaces, allow a faster filling of elastomeric channels, up to almost an order of magnitude with respect to conventional microfluidics.

Note

cited By 9

URLhttps://www.scopus.com/inward/record.uri?eid=2-s2.0-2942726603&doi=10.1021%2fla049943q&partnerID=40&md5=8f4527720306dde8c7c53c6761f30f35
DOI10.1021/la049943q
Citation KeyPisignano20044802