| Titolo | Polymer to polymer to polymer pattern transfer: Multiple molding for 100 nm scale lithography |
|---|---|
| Tipo di pubblicazione | Articolo su Rivista peer-reviewed |
| Anno di Pubblicazione | 2006 |
| Autori | Mele, E., Di Benedetto Francesca, Persano L., Cingolani R., and Pisignano D. |
| Rivista | Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures |
| Volume | 24 |
| Paginazione | 807-812 |
| ISSN | 10711023 |
| Parole chiave | Elastomers, Lithography, Micromachining, Nanoimprinting lithographies, Pattern transfer, Plastics molding, Polymers, Replica molding, Ultraviolet radiation |
| Abstract | We demonstrate a multiple molding procedure based on the combination of replica molding, in situ patterning of an ultraviolet curable epoxy resist, micromachining by elastomeric elements, and nanoimprinting lithography. The pattern, with features down to the 100 nm scale, is sequentially transferred to several different polymers, allowing one to realize high-resolution organic molds for imprinting compounds of lower glass-transition temperature. The intimate integration of soft and nanoimprinting lithographies enables a combined, multistep mechanical patterning, which can be very useful for a great range of applications for molecular lithography and devices. © 2006 American Vacuum Society. |
| Note | cited By 10 |
| URL | https://www.scopus.com/inward/record.uri?eid=2-s2.0-33645502869&doi=10.1116%2f1.2184327&partnerID=40&md5=aea247b1d3ae3dba505e9e365de38eb0 |
| DOI | 10.1116/1.2184327 |
| Citation Key | Mele2006807 |
