| Titolo | Laser damage dependence on structural and optical properties of ion-assisted HfO2 thin films |
|---|---|
| Tipo di pubblicazione | Articolo su Rivista peer-reviewed |
| Anno di Pubblicazione | 2001 |
| Autori | Alvisi, Marco, de Tomasi F., Perrone M.R., Protopapa Maria Lucia, Rizzo Antonella, Sarto F., and Scaglione S. |
| Rivista | Thin Solid Films |
| Volume | 396 |
| Paginazione | 44-52 |
| ISSN | 00406090 |
| Parole chiave | Excimer lasers, Hafnium compounds, Ion-assisted thin films, Laser beam effects, Physical vapor deposition, Radiation damage, Silica, Substrates, Thin films |
| Abstract | Laser damage studies at 248 nm (KrF excimer laser) have been performed on HfO2 films of 300 nm thickness deposited on silica substrates by the Xe ion-assisted electron beam evaporation technique. The assistance parameters (ion mass, energy and current density) have been adjusted to investigate the effect of the Xe-ion momentum transfer parameter P on the film optical and structural properties. Then, the dependence of laser damage fluence on film properties has been studied. Higher laser damage fluences have been found for the HfO2 films deposited at lower P values and characterized by a fully crystalline structure with the grain of smaller size and randomly oriented. © 2001 Elsevier Science B.V. All rights reserved. |
| Note | cited By 50 |
| URL | https://www.scopus.com/inward/record.uri?eid=2-s2.0-0035928990&doi=10.1016%2fS0040-6090%2801%2901184-1&partnerID=40&md5=be7e3c5ecbe0d1919b51ec299b14ee60 |
| DOI | 10.1016/S0040-6090(01)01184-1 |
| Citation Key | Alvisi200144 |
